A 7-Mask CMOS Process with Selective Oxide Deposition

T.Horiuchi T.Horiuchi, K.Kanba K.Kanba, T.Homma T.Homma, Y.Murao Y.Murao, K.Okumura K.Okumura, Tetsuya Homma

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1455-1460
Journal	IEEE Transaction on Electron Devices
Volume	40
Publication status	Published - 1993 Aug 1

Cite this

@article{acba575c152d4a08a6a8b7dd01d2dee1,

title = "A 7-Mask CMOS Process with Selective Oxide Deposition",

author = "T.Horiuchi T.Horiuchi and K.Kanba K.Kanba and T.Homma T.Homma and Y.Murao Y.Murao and K.Okumura K.Okumura and Tetsuya Homma",

year = "1993",

month = aug,

day = "1",

language = "English",

volume = "40",

pages = "1455--1460",

journal = "IEEE Transaction on Electron Devices",

}