A New Characterization Technique for Depth-Dependent Dielectric Properties of High-k Films by Open-Circuit Potential Measurement

K. Kita, M. Sasagawa, K. Kyuno, A. Torium

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)166-170
Journal2003 Int. Conference on Characterization and Metrology for ULSI Technology; AIP Conf. Proceedings 550
Publication statusPublished - 2003 Mar 1

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