A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	71-75
Journal	Proceedings of 10th VLSI Multilevel Interconnection Conference
Publication status	Published - 1993 Jun 8

Cite this

@article{32e42b3300d240fda8a9788bea74b22c,

title = "A New Interlayer Dielectric Film Formation Technology Using Room Temperature Flow CVD",

author = "T.Homma T.Homma and Y.Murao Y.Murao and Tetsuya Homma",

year = "1993",

month = jun,

day = "8",

language = "English",

pages = "71--75",

journal = "Proceedings of 10th VLSI Multilevel Interconnection Conference",

}