A Room Temperature CVD Technology for Interlayer in Deep submicron Multilevel Interconnection

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	289-292
Journal	Proceedings of IEEE International Electron Devices Meeting
Publication status	Published - 1991 Dec 8

Cite this

@article{20b447d2f4a84c9bb15313a82a9959a4,

title = "A Room Temperature CVD Technology for Interlayer in Deep submicron Multilevel Interconnection",

author = "T.Homma T.Homma and Y.Murao Y.Murao and Tetsuya Homma",

year = "1991",

month = dec,

day = "8",

language = "English",

pages = "289--292",

journal = "Proceedings of IEEE International Electron Devices Meeting",

}