TY - GEN
T1 - An algorithm to visualize tool difference transitions in semiconductor fabrications
AU - Kubo, Tomoaki
AU - Minami, Masateru
AU - Homma, Tetsuya
N1 - Copyright:
Copyright 2011 Elsevier B.V., All rights reserved.
PY - 2008
Y1 - 2008
N2 - To solve tool difference problems in semiconductor fabrication, it is necessary to identify problematic tool from numbers of process tools and process steps, and discover the cause of its performance difference. In this paper we propose a method to assist engineers in finding cause of tool difference. This method visualizes tool difference transition by post-processing results of periodically executed regression analysis. Effectiveness of this method is shown by Monte Carlo simulation based on a conceptual model of a fabrication line.
AB - To solve tool difference problems in semiconductor fabrication, it is necessary to identify problematic tool from numbers of process tools and process steps, and discover the cause of its performance difference. In this paper we propose a method to assist engineers in finding cause of tool difference. This method visualizes tool difference transition by post-processing results of periodically executed regression analysis. Effectiveness of this method is shown by Monte Carlo simulation based on a conceptual model of a fabrication line.
UR - http://www.scopus.com/inward/record.url?scp=79952559749&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79952559749&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:79952559749
SN - 9784990413828
T3 - IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
SP - 215
EP - 218
BT - 2008 International Symposium on Semiconductor Manufacturing, ISSM 2008
T2 - 2008 17th International Symposium on Semiconductor Manufacturing, ISSM 2008
Y2 - 27 October 2008 through 29 October 2008
ER -