Angle dependent sputtering and dimer formation from vanadium nitride target by Ar+ ion bombardment

S. Kawaguchi; M. Kudo; M. Tanemura; L. Miao; S. Tanemura; Y. Gotoh; M. Liao; S. Shinkai

Angle dependent sputtering and dimer formation from vanadium nitride target by Ar⁺ ion bombardment

S. Kawaguchi, M. Kudo, M. Tanemura, L. Miao, S. Tanemura, Y. Gotoh, M. Liao, S. Shinkai

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A compact angle-resolved secondary ion mass spectrometer (AR-SIMS) with a special geometrical configuration, composing of a differentially pumped micro-beam ion-gun, a tillable sample stage and a time-of-flight (TOF) mass spectrometer was applied to measure angular distribution (AD) of secondary ions ejected from VN by oblique 3 keV Ar⁺ sputtering at room temperature. AD of V⁺ was almost identical with that of N⁺, strongly suggesting that Gibbsian segregation did not take place during sputtering. Since the angular dependence of VN Yv⁺ and V₂ ⁺/V⁺ intensity ratios was independent of that of N ⁺ and V⁺ intensities, VN⁺ and V ₂⁺ dimer ions were generated via the "as such" direct emission process.

Original language	English
Title of host publication	AICAM 2005 - Proceedings of the Asian International Conference on Advanced Materials
Publisher	Trans Tech Publications
Pages	607-610
Number of pages	4
ISBN (Print)	0878499792, 9780878499793
Publication status	Published - 2006
Externally published	Yes
Event	AICAM 2005 - Asian International Conference on Advanced Materials - Beijing, China Duration: 2005 Nov 3 → 2005 Nov 5

Publication series

Name	Advanced Materials Research
Volume	11-12
ISSN (Print)	1022-6680

Conference

Conference	AICAM 2005 - Asian International Conference on Advanced Materials
Country/Territory	China
City	Beijing
Period	05/11/3 → 05/11/5

Keywords

Angular distribution
Clusters
Secondary ion mass spectrometer
Sputtering
Vanadium nitride

ASJC Scopus subject areas

Engineering(all)

Cite this

Kawaguchi, S., Kudo, M., Tanemura, M., Miao, L., Tanemura, S., Gotoh, Y., Liao, M., & Shinkai, S. (2006). Angle dependent sputtering and dimer formation from vanadium nitride target by Ar⁺ ion bombardment. In AICAM 2005 - Proceedings of the Asian International Conference on Advanced Materials (pp. 607-610). (Advanced Materials Research; Vol. 11-12). Trans Tech Publications.

Angle dependent sputtering and dimer formation from vanadium nitride target by Ar⁺ ion bombardment. / Kawaguchi, S.; Kudo, M.; Tanemura, M. et al.
AICAM 2005 - Proceedings of the Asian International Conference on Advanced Materials. Trans Tech Publications, 2006. p. 607-610 (Advanced Materials Research; Vol. 11-12).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Kawaguchi, S, Kudo, M, Tanemura, M, Miao, L, Tanemura, S, Gotoh, Y, Liao, M & Shinkai, S 2006, Angle dependent sputtering and dimer formation from vanadium nitride target by Ar⁺ ion bombardment. in AICAM 2005 - Proceedings of the Asian International Conference on Advanced Materials. Advanced Materials Research, vol. 11-12, Trans Tech Publications, pp. 607-610, AICAM 2005 - Asian International Conference on Advanced Materials, Beijing, China, 05/11/3.

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AU - Kawaguchi, S.

AU - Kudo, M.

AU - Tanemura, M.

AU - Miao, L.

AU - Tanemura, S.

AU - Gotoh, Y.

AU - Liao, M.

AU - Shinkai, S.

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AB - A compact angle-resolved secondary ion mass spectrometer (AR-SIMS) with a special geometrical configuration, composing of a differentially pumped micro-beam ion-gun, a tillable sample stage and a time-of-flight (TOF) mass spectrometer was applied to measure angular distribution (AD) of secondary ions ejected from VN by oblique 3 keV Ar+ sputtering at room temperature. AD of V+ was almost identical with that of N+, strongly suggesting that Gibbsian segregation did not take place during sputtering. Since the angular dependence of VN Yv+ and V2 +/V+ intensity ratios was independent of that of N + and V+ intensities, VN+ and V 2+ dimer ions were generated via the "as such" direct emission process.

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KW - Secondary ion mass spectrometer

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KW - Vanadium nitride

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