TY - JOUR
T1 - Application of bessel beams for microfabrication of dielectrics by femtosecond laser
AU - Marcinkevicius, Andrius
AU - Juodkazis, Saulius
AU - Matsuo, Shigeki
AU - Mizeikis, Vygantas
AU - Misawa, Hiroaki
PY - 2001/11/1
Y1 - 2001/11/1
N2 - We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 102-103 in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.
AB - We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 102-103 in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.
KW - Bessel beam
KW - Laser materials processing
KW - Laser-induced breakdown
KW - Ultrafast phenomena
KW - Vitreous silica
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U2 - 10.1143/jjap.40.l1197
DO - 10.1143/jjap.40.l1197
M3 - Letter
AN - SCOPUS:0035517470
SN - 0021-4922
VL - 40
SP - L1197-L1199
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 11 A
ER -