Barrier Reliability Evaluation of Electroless Diffusion Barriers and Organosilane Monolayer by Bias Temperature Stress (BTS) Tests

A. Mitsumori, S. Fujishima, K. Ueno

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	88-89
Journal	Extended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session
Publication status	Published - 2012 Sept 14

Cite this

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title = "Barrier Reliability Evaluation of Electroless Diffusion Barriers and Organosilane Monolayer by Bias Temperature Stress (BTS) Tests",

author = "A. Mitsumori and S. Fujishima and K. Ueno",

year = "2012",

month = sep,

day = "14",

language = "English",

pages = "88--89",

journal = "Extended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session",

}

TY - JOUR

T1 - Barrier Reliability Evaluation of Electroless Diffusion Barriers and Organosilane Monolayer by Bias Temperature Stress (BTS) Tests

AU - Mitsumori, A.

AU - Fujishima, S.

AU - Ueno, K.

PY - 2012/9/14

Y1 - 2012/9/14

M3 - Article

SP - 88

EP - 89

JO - Extended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session

JF - Extended Abstracts of Advanced Metallization Conference 2011: 21st Asian Session

ER -