Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

Yasuhiro Miyake; Hiroyuki Nishikawa; Eiki Watanabe; Daisuke Ito

doi:10.1016/S0022-3093(97)90123-X

Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

Yasuhiro Miyake, Hiroyuki Nishikawa, Eiki Watanabe, Daisuke Ito

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10^-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm²/pulse, 27 kJ/cm²), while the Δn obtained for a non-treated sample is less than 10^-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.

Original language	English
Pages (from-to)	266-271
Number of pages	6
Journal	Journal of Non-Crystalline Solids
Volume	222
DOIs	https://doi.org/10.1016/S0022-3093(97)90123-X
Publication status	Published - 1997 Dec 11
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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10.1016/S0022-3093(97)90123-X

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title = "Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser",

abstract = "Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.",

author = "Yasuhiro Miyake and Hiroyuki Nishikawa and Eiki Watanabe and Daisuke Ito",

note = "Funding Information: This work is partly supportedb y Grants-in-Aid from the Tokyo MetropolitanU niversitya nd the Japanese Ministry of Education, Science, and Culture (No. 07805033).",

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doi = "10.1016/S0022-3093(97)90123-X",

language = "English",

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T1 - Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

AU - Miyake, Yasuhiro

AU - Nishikawa, Hiroyuki

AU - Watanabe, Eiki

AU - Ito, Daisuke

N1 - Funding Information: This work is partly supportedb y Grants-in-Aid from the Tokyo MetropolitanU niversitya nd the Japanese Ministry of Education, Science, and Culture (No. 07805033).

PY - 1997/12/11

Y1 - 1997/12/11

N2 - Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.

AB - Refractive-index changes (Δn) in Ge-doped silica glass exposed to a KrF excimer laser were investigated by measurements of the diffraction efficiency from a grating formed using a phase mask. The Δn of 3.2 × 10-3 was achieved for a hydrogen-treated (150 atm, 2 weeks, room temperature) sample after a KrF laser irradiation (25 Hz, 0.5 J/cm2/pulse, 27 kJ/cm2), while the Δn obtained for a non-treated sample is less than 10-4. The depth profile of the Δn for the hydrogen-treated sample is limited by the distribution in the hydrogen concentration inside the sample, while it is determined by the attenuation of the ultraviolet light for the non-treated sample.

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JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

ER -

Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser

Abstract

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