Characterization of electroplated, thick permalloy films

S. Getlawi; M. Theis; S. Friedrich; A. Koblischka-Veneva; M. R. Koblischka; M. Saumer; U. Hartmann

doi:10.1002/pssa.200723621

Characterization of electroplated, thick permalloy films

S. Getlawi, M. Theis, S. Friedrich, A. Koblischka-Veneva, M. R. Koblischka, M. Saumer, U. Hartmann

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Permalloy (Ni ₁₈Fe ₁₉) films and foils were fabricated by means of electroplating. Two different types of samples were produced, (i) a patterned permalloy film on a Si wafer (type 1) and (ii) a NiFe foil (type 2), which was separated from the substrate after deposition. The samples were characterized employing magnetic force microscopy (MFM), transmission electron microscopy (TEM) and electron-backscatter diffraction (EBSD). On the foil type sample, MFM reveals a maze domain pattern, and on the structured samples (type 1), a Landau domain pattern is obtained. EBSD enables the identification of the permalloy Kikuchi pattern without the effect of a substrate. The analysis reveals randomly oriented grains with a narrow size distribution.

Original language	English
Pages (from-to)	1809-1812
Number of pages	4
Journal	Physica Status Solidi (A) Applications and Materials Science
Volume	205
Issue number	8
DOIs	https://doi.org/10.1002/pssa.200723621
Publication status	Published - 2008 Aug
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Electrical and Electronic Engineering
Materials Chemistry

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10.1002/pssa.200723621

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abstract = "Permalloy (Ni 18Fe 19) films and foils were fabricated by means of electroplating. Two different types of samples were produced, (i) a patterned permalloy film on a Si wafer (type 1) and (ii) a NiFe foil (type 2), which was separated from the substrate after deposition. The samples were characterized employing magnetic force microscopy (MFM), transmission electron microscopy (TEM) and electron-backscatter diffraction (EBSD). On the foil type sample, MFM reveals a maze domain pattern, and on the structured samples (type 1), a Landau domain pattern is obtained. EBSD enables the identification of the permalloy Kikuchi pattern without the effect of a substrate. The analysis reveals randomly oriented grains with a narrow size distribution.",

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T1 - Characterization of electroplated, thick permalloy films

AU - Getlawi, S.

AU - Theis, M.

AU - Friedrich, S.

AU - Koblischka-Veneva, A.

AU - Koblischka, M. R.

AU - Saumer, M.

AU - Hartmann, U.

PY - 2008/8

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AB - Permalloy (Ni 18Fe 19) films and foils were fabricated by means of electroplating. Two different types of samples were produced, (i) a patterned permalloy film on a Si wafer (type 1) and (ii) a NiFe foil (type 2), which was separated from the substrate after deposition. The samples were characterized employing magnetic force microscopy (MFM), transmission electron microscopy (TEM) and electron-backscatter diffraction (EBSD). On the foil type sample, MFM reveals a maze domain pattern, and on the structured samples (type 1), a Landau domain pattern is obtained. EBSD enables the identification of the permalloy Kikuchi pattern without the effect of a substrate. The analysis reveals randomly oriented grains with a narrow size distribution.

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Characterization of electroplated, thick permalloy films

Abstract

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