Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures using a hydrogen plasma, an oxygen plasma, and hexafluoroacetylacetone vapors

Kazuyoshi Ueno, Vincent M. Donnelly, Yasuaki Tsuchiya

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

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Engineering & Materials Science

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