Current status of copper multilevel interconnects (Invited)

K.Ueno K.Ueno, M.Iguchi M.Iguchi, T.Yokoyama T.Yokoyama, N.Oda N.Oda, H.Miyamoto H.Miyamoto, Y.Matsubara Y.Matsubara, T.Horiuchi T.Horiuchi, S.Saito S.Saito, Kazuyoshi Ueno

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)1-8
JournalProceedings of 1st International Conference on Semiconductor Technology
Volume2
Publication statusPublished - 2001 Mar 1

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