Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD

Shiro Shimada, Yusuke Fuji, Hajime Kiyono, Jiro Tsujino, Isao Yamazaki

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


Composite TiBC-SiC film coatings with various contents of SiC were deposited on Si wafer at 800°C from a mixed solution of titanium tetra-ethoxide, boron tri-ethoxide and/or hexa-methyl-disiloxane by an Ar/H 2 thermal plasma CVD. The crystalline phases (TiB2, TiC, SiC) in the coatings are identified by thin film grazing incidence X-ray diffraction. The surfaces and cross-sections of the monolithic TiBC and SiC and composite TiBC-SiC coatings are observed by scanning electron microscopy. The microstructure of a cross-section of composite TiBC-55 mol% SiC film is observed by transmission electron microscopy with EDX analysis. The wear rates of the composite TiBC-SiC film are evaluated from cross-sectional profiles of the residual wear tracks formed by ball-on-disk wear tests using SUS and alumina balls with their results correlated with the SiC content and film hardness.

Original languageEnglish
Pages (from-to)415-420
Number of pages6
JournalJournal of the Ceramic Society of Japan
Issue number1364
Publication statusPublished - 2009 Apr
Externally publishedYes


  • CVD
  • Composite
  • Thermal plasma
  • TiBC-SiC
  • Wear resistance

ASJC Scopus subject areas

  • Ceramics and Composites
  • General Chemistry
  • Condensed Matter Physics
  • Materials Chemistry


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