Effect of generation and soft lithography on semiconducting dendrimer lasers

Justin R. Lawrence, Ebinazar B. Namdas, Gary J. Richards, Paul L. Burn, Ifor D.W. Samuel

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)


A study was conducted to investigate the effect of increasing generation on the photophysics and laser performance of a bis-fluorene cored dendrimer. It was found that increasing generation from (G1) to (G2) leads to a rise in the film PLQY from 42-75%. Researchers also fabricated dendrimer distributed feedback (DFB) lasers and an improvement in slope efficiency from 0.3-1.6% was observed as the generation increased. The performance of G2 dendrimer lasers was compared with a laser made by the process of spin-coating the gain material onto a corrugated substrate, using soft lithography. It was observed that the first generation dendrimer (G1) had one level of branching, while the second generation dendrimer (G2) had two levels of branching. The results show the benefits of using a soft lithographic technique, to provide feedback in organic DFB lasers.

Original languageEnglish
Pages (from-to)3000-3003
Number of pages4
JournalAdvanced Materials
Issue number19
Publication statusPublished - 2007 Oct 5
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering


Dive into the research topics of 'Effect of generation and soft lithography on semiconducting dendrimer lasers'. Together they form a unique fingerprint.

Cite this