Effect of Temperature for Photoresist Critical Dimension during Puddle Development

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	3354-3358
Journal	Japanese Journal of Applied Physics
Volume	46
Publication status	Published - 2007 Jun 1

Cite this

@article{e5077272f7b44acaab430ebdba0edd48,

title = "Effect of Temperature for Photoresist Critical Dimension during Puddle Development",

author = "H. Eto and Homma, {H. Eto;Y.Ito;T.}",

year = "2007",

month = jun,

day = "1",

language = "English",

volume = "46",

pages = "3354--3358",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

}