Original language | English |
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Pages (from-to) | 362-368 |
Journal | Journal of Crystal Growth |
Volume | 186 |
Publication status | Published - 1997 Aug 28 |
Effects of Argon Gas Flow Rate and Furnace Pressure on Oxygen Concentration in Czochralski-Grown Silicon Crystals
Masahiro Shoji, Naoki Ono, Keisei Abe, Michio Kida, Yasuo Shimizu
Research output: Contribution to journal › Article › peer-review