Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Yusuke Tanabe; Hiroyuki Nishikawa; Yoshihiro Seki; Takahiro Satoh; Yasuyuki Ishii; Tomihiro Kamiya; Tohru Watanabe; Atsushi Sekiguchi

doi:10.1016/j.mee.2011.01.019

Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Yusuke Tanabe, Hiroyuki Nishikawa, Yoshihiro Seki, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Tohru Watanabe, Atsushi Sekiguchi

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Proton beam writing (PBW) was applied for micromachining of a PMMA mother for Ni electroforming. Proton beam focused down to about 1 μm at beam energy of 1.0-3.0 MeV was used for PBW on a PMMA layer on Si or Cu substrate. Using modified techniques for developing of 15-30-μm thick resists exposed to PB and electroforming steps, fabrication of the Ni structures with aspect ratio up to 30 by electroforming with a 30-μm thick PMMA mother micromachined by PBW was successful. We also tried thermal imprint using a 15-μm thick Ni microstructure on Cu substrate with an aspect ratio of more than 4 on a PMMA film.

Original language	English
Pages (from-to)	2145-2148
Number of pages	4
Journal	Microelectronic Engineering
Volume	88
Issue number	8
DOIs	https://doi.org/10.1016/j.mee.2011.01.019
Publication status	Published - 2011 Aug

Keywords

Electroforming
Imprint lithography
Mold
Proton beam writing

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2011.01.019

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@article{ea9d7908121f46e8835f366ad18a4d0a,

title = "Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing",

abstract = "Proton beam writing (PBW) was applied for micromachining of a PMMA mother for Ni electroforming. Proton beam focused down to about 1 μm at beam energy of 1.0-3.0 MeV was used for PBW on a PMMA layer on Si or Cu substrate. Using modified techniques for developing of 15-30-μm thick resists exposed to PB and electroforming steps, fabrication of the Ni structures with aspect ratio up to 30 by electroforming with a 30-μm thick PMMA mother micromachined by PBW was successful. We also tried thermal imprint using a 15-μm thick Ni microstructure on Cu substrate with an aspect ratio of more than 4 on a PMMA film.",

keywords = "Electroforming, Imprint lithography, Mold, Proton beam writing",

author = "Yusuke Tanabe and Hiroyuki Nishikawa and Yoshihiro Seki and Takahiro Satoh and Yasuyuki Ishii and Tomihiro Kamiya and Tohru Watanabe and Atsushi Sekiguchi",

note = "Funding Information: This work was supported by “Academic Frontier” Project and Grant-in-Aid for Scientific Research of the Ministry of Education, Culture, Sports, Science, and Technology, Japan . We also acknowledge the Maruzen Petrochemical Co., Ltd. for providing a customized resist of thick PMMA layers for electroforming.",

year = "2011",

month = aug,

doi = "10.1016/j.mee.2011.01.019",

language = "English",

volume = "88",

pages = "2145--2148",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "8",

}

TY - JOUR

T1 - Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

AU - Tanabe, Yusuke

AU - Nishikawa, Hiroyuki

AU - Seki, Yoshihiro

AU - Satoh, Takahiro

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

AU - Watanabe, Tohru

AU - Sekiguchi, Atsushi

N1 - Funding Information: This work was supported by “Academic Frontier” Project and Grant-in-Aid for Scientific Research of the Ministry of Education, Culture, Sports, Science, and Technology, Japan . We also acknowledge the Maruzen Petrochemical Co., Ltd. for providing a customized resist of thick PMMA layers for electroforming.

PY - 2011/8

Y1 - 2011/8

N2 - Proton beam writing (PBW) was applied for micromachining of a PMMA mother for Ni electroforming. Proton beam focused down to about 1 μm at beam energy of 1.0-3.0 MeV was used for PBW on a PMMA layer on Si or Cu substrate. Using modified techniques for developing of 15-30-μm thick resists exposed to PB and electroforming steps, fabrication of the Ni structures with aspect ratio up to 30 by electroforming with a 30-μm thick PMMA mother micromachined by PBW was successful. We also tried thermal imprint using a 15-μm thick Ni microstructure on Cu substrate with an aspect ratio of more than 4 on a PMMA film.

AB - Proton beam writing (PBW) was applied for micromachining of a PMMA mother for Ni electroforming. Proton beam focused down to about 1 μm at beam energy of 1.0-3.0 MeV was used for PBW on a PMMA layer on Si or Cu substrate. Using modified techniques for developing of 15-30-μm thick resists exposed to PB and electroforming steps, fabrication of the Ni structures with aspect ratio up to 30 by electroforming with a 30-μm thick PMMA mother micromachined by PBW was successful. We also tried thermal imprint using a 15-μm thick Ni microstructure on Cu substrate with an aspect ratio of more than 4 on a PMMA film.

KW - Electroforming

KW - Imprint lithography

KW - Mold

KW - Proton beam writing

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U2 - 10.1016/j.mee.2011.01.019

DO - 10.1016/j.mee.2011.01.019

M3 - Article

AN - SCOPUS:79960041131

SN - 0167-9317

VL - 88

SP - 2145

EP - 2148

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 8

ER -

Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing

Abstract

Keywords

ASJC Scopus subject areas

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