Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

K. Mitsuishi, M. Shimojo, M. Han, K. Furuya

Research output: Contribution to journalArticlepeer-review

121 Citations (Scopus)


The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).

Original languageEnglish
Pages (from-to)2064-2066
Number of pages3
JournalApplied Physics Letters
Issue number10
Publication statusPublished - 2003 Sept 8
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


Dive into the research topics of 'Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons'. Together they form a unique fingerprint.

Cite this