Electroplating of metal micro-structure using a resist micro-machined by proton beam writing

N. Uchiya; Y. Furuta; H. Nishikawa; T. Watanabe; J. Haga; T. Satoh; M. Oikawa; T. Ohkubo; Y. Ishii; T. Kamiya

doi:10.1109/IMNC.2007.4456217

Electroplating of metal micro-structure using a resist micro-machined by proton beam writing

N. Uchiya, Y. Furuta, H. Nishikawa, T. Watanabe, J. Haga, T. Satoh, M. Oikawa, T. Ohkubo, Y. Ishii, T. Kamiya

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages	288-289
Number of pages	2
DOIs	https://doi.org/10.1109/IMNC.2007.4456217
Publication status	Published - 2007
Event	s20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan Duration: 2007 Nov 5 → 2007 Nov 8

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Conference

Conference	s20th International Microprocesses and Nanotechnology Conference, MNC 2007
Country/Territory	Japan
City	Kyoto
Period	07/11/5 → 07/11/8

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

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10.1109/IMNC.2007.4456217

Cite this

Uchiya, N., Furuta, Y., Nishikawa, H., Watanabe, T., Haga, J., Satoh, T., Oikawa, M., Ohkubo, T., Ishii, Y., & Kamiya, T. (2007). Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 288-289). [4456217] (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). https://doi.org/10.1109/IMNC.2007.4456217

Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. / Uchiya, N.; Furuta, Y.; Nishikawa, H. et al.
Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 288-289 4456217 (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Uchiya, N, Furuta, Y, Nishikawa, H, Watanabe, T, Haga, J, Satoh, T, Oikawa, M, Ohkubo, T, Ishii, Y & Kamiya, T 2007, Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC., 4456217, Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, pp. 288-289, s20th International Microprocesses and Nanotechnology Conference, MNC 2007, Kyoto, Japan, 07/11/5. https://doi.org/10.1109/IMNC.2007.4456217

Uchiya N, Furuta Y, Nishikawa H, Watanabe T, Haga J, Satoh T et al. Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 288-289. 4456217. (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). doi: 10.1109/IMNC.2007.4456217

Uchiya, N. ; Furuta, Y. ; Nishikawa, H. et al. / Electroplating of metal micro-structure using a resist micro-machined by proton beam writing. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. pp. 288-289 (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC).

@inproceedings{f386472ec2eb4ef58865a4b017432857,

title = "Electroplating of metal micro-structure using a resist micro-machined by proton beam writing",

abstract = "The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.",

author = "N. Uchiya and Y. Furuta and H. Nishikawa and T. Watanabe and J. Haga and T. Satoh and M. Oikawa and T. Ohkubo and Y. Ishii and T. Kamiya",

year = "2007",

doi = "10.1109/IMNC.2007.4456217",

language = "English",

isbn = "4990247248",

series = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",

pages = "288--289",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",

note = "s20th International Microprocesses and Nanotechnology Conference, MNC 2007 ; Conference date: 05-11-2007 Through 08-11-2007",

}

TY - GEN

T1 - Electroplating of metal micro-structure using a resist micro-machined by proton beam writing

AU - Uchiya, N.

AU - Furuta, Y.

AU - Nishikawa, H.

AU - Watanabe, T.

AU - Haga, J.

AU - Satoh, T.

AU - Oikawa, M.

AU - Ohkubo, T.

AU - Ishii, Y.

AU - Kamiya, T.

PY - 2007

Y1 - 2007

N2 - The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.

AB - The micro-structure of PMMA was successfully transcribed to the Ni structure as a reversal pattern. The PBW was useful method to obtain high-aspect-ratio metal micro-structures, coupled with the electroplating technique. Therefore, the PBW is a promising tool for fabrication of metal components such as a stamp for imprint lithography [6]. Imprinting using the 300-nm-thick Ni structure on PMMA was also demonstrated.

UR - http://www.scopus.com/inward/record.url?scp=47349119042&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=47349119042&partnerID=8YFLogxK

U2 - 10.1109/IMNC.2007.4456217

DO - 10.1109/IMNC.2007.4456217

M3 - Conference contribution

AN - SCOPUS:47349119042

SN - 4990247248

SN - 9784990247249

T3 - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

SP - 288

EP - 289

BT - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

T2 - s20th International Microprocesses and Nanotechnology Conference, MNC 2007

Y2 - 5 November 2007 through 8 November 2007

ER -

Electroplating of metal micro-structure using a resist micro-machined by proton beam writing

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