Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

Nitipon Puttaraksa, Somrit Unai, Michael W. Rhodes, Kanda Singkarat, Harry J. Whitlow, Somsorn Singkarat

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)


In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1-1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device.

Original languageEnglish
Pages (from-to)149-152
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Publication statusPublished - 2012 Feb 1
Externally publishedYes


  • MeV ion beam lithography
  • PDMS
  • Soft-lithography

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation


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