Fabrication of Bi2SiO5 Thin Films for MFIS Structures

M.Yamaguchi M.Yamaguchi, K.Hiraki K.Hiraki, T.Homma T.Homma, T.Nagatomo T.Nagatomo, Y.Masuda Y.Masuda, Tetsuya Homma

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	629-632
Journal	Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF)
Volume	II
Publication status	Published - 2001 Mar 1

Cite this

@article{c5971a6cce8442e7a9a7287fe187565f,

title = "Fabrication of Bi2SiO5 Thin Films for MFIS Structures",

author = "M.Yamaguchi M.Yamaguchi and K.Hiraki K.Hiraki and T.Homma T.Homma and T.Nagatomo T.Nagatomo and Y.Masuda Y.Masuda and Tetsuya Homma",

year = "2001",

month = mar,

day = "1",

language = "English",

volume = "II",

pages = "629--632",

journal = "Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF)",

}

TY - JOUR

T1 - Fabrication of Bi2SiO5 Thin Films for MFIS Structures

AU - M.Yamaguchi, M.Yamaguchi

AU - K.Hiraki, K.Hiraki

AU - T.Homma, T.Homma

AU - T.Nagatomo, T.Nagatomo

AU - Y.Masuda, Y.Masuda

AU - Homma, Tetsuya

PY - 2001/3/1

Y1 - 2001/3/1

M3 - Article

VL - II

SP - 629

EP - 632

JO - Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF)

JF - Proceedings of 12th International Symposium on the Application of Ferroelectrics(ISAF)

ER -