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Fabrication of electroless CoWP/NiB diffusion barrier layer on SiO 2 for ULSI Devices
Tetsuya Osaka, Hitoshi Aramaki, Masahiro Yoshino, Kazuyoshi Ueno, Itsuaki Matsuda, Yosi Shacham-Diamand
Research output: Contribution to journal › Article › peer-review
24
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(Scopus)