Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam

Kenta Miura; Yuki Machida; Masato Uehara; Hiromu Kiryu; Yusuke Ozawa; Tomoyuki Sasaki; Osamu Hanaizumi; Takahiro Satoh; Yasuyuki Ishii; Masashi Kohka; Katsuyoshi Takano; Takeru Ohkubo; Akiyoshi Yamazaki; Wataru Kada; Akihito Yokoyama; Tomihiro Kamiya; Hiroyuki Nishikawa

doi:10.4028/www.scientific.net/KEM.497.147

Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam

Kenta Miura, Yuki Machida, Masato Uehara, Hiromu Kiryu, Yusuke Ozawa, Tomoyuki Sasaki, Osamu Hanaizumi, Takahiro Satoh, Yasuyuki Ishii, Masashi Kohka, Katsuyoshi Takano, Takeru Ohkubo, Akiyoshi Yamazaki, Wataru Kada, Akihito Yokoyama, Tomihiro Kamiya, Hiroyuki Nishikawa

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

10 Citations (Scopus)

Abstract

Proton beam writing (PBW) has attracted much attention recently as a next-generation micro-fabrication technology. It is a direct-drawing technique and does not need any masks to transfer micro-patterns to sample surfaces. In addition, the refractive index of a poly(methyl methacrylate) (PMMA) can be increased by proton-beam irradiation. In this study, we fabricated the first 1.5-μm-band single-mode, straight-line waveguides and Y-junction waveguides consisting of PMMA layers using the PBW technique.

Original language	English
Title of host publication	Silicon Science and Advanced Micro-Device Engineering II
Publisher	Trans Tech Publications Ltd
Pages	147-150
Number of pages	4
ISBN (Print)	9783037852859
DOIs	https://doi.org/10.4028/www.scientific.net/KEM.497.147
Publication status	Published - 2012
Event	6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, ISSS and AMDE 2010 - Kiryu, Japan Duration: 2010 Dec 9 → 2010 Dec 10

Publication series

Name	Key Engineering Materials
Volume	497
ISSN (Print)	1013-9826
ISSN (Electronic)	1662-9795

Conference

Conference	6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, ISSS and AMDE 2010
Country/Territory	Japan
City	Kiryu
Period	10/12/9 → 10/12/10

Keywords

1.5-μm band
Optical waveguide
PMMA
Proton beam writing
Single mode
Y junction

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

Access to Document

10.4028/www.scientific.net/KEM.497.147

Cite this

Miura, K., Machida, Y., Uehara, M., Kiryu, H., Ozawa, Y., Sasaki, T., Hanaizumi, O., Satoh, T., Ishii, Y., Kohka, M., Takano, K., Ohkubo, T., Yamazaki, A., Kada, W., Yokoyama, A., Kamiya, T., & Nishikawa, H. (2012). Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam. In Silicon Science and Advanced Micro-Device Engineering II (pp. 147-150). (Key Engineering Materials; Vol. 497). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/KEM.497.147

Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam. / Miura, Kenta; Machida, Yuki; Uehara, Masato et al.
Silicon Science and Advanced Micro-Device Engineering II. Trans Tech Publications Ltd, 2012. p. 147-150 (Key Engineering Materials; Vol. 497).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Miura, K, Machida, Y, Uehara, M, Kiryu, H, Ozawa, Y, Sasaki, T, Hanaizumi, O, Satoh, T, Ishii, Y, Kohka, M, Takano, K, Ohkubo, T, Yamazaki, A, Kada, W, Yokoyama, A, Kamiya, T & Nishikawa, H 2012, Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam. in Silicon Science and Advanced Micro-Device Engineering II. Key Engineering Materials, vol. 497, Trans Tech Publications Ltd, pp. 147-150, 6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, ISSS and AMDE 2010, Kiryu, Japan, 10/12/9. https://doi.org/10.4028/www.scientific.net/KEM.497.147

@inproceedings{2b2e65f65cd144c8ba8f68d4ff89b38c,

title = "Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam",

abstract = "Proton beam writing (PBW) has attracted much attention recently as a next-generation micro-fabrication technology. It is a direct-drawing technique and does not need any masks to transfer micro-patterns to sample surfaces. In addition, the refractive index of a poly(methyl methacrylate) (PMMA) can be increased by proton-beam irradiation. In this study, we fabricated the first 1.5-μm-band single-mode, straight-line waveguides and Y-junction waveguides consisting of PMMA layers using the PBW technique.",

keywords = "1.5-μm band, Optical waveguide, PMMA, Proton beam writing, Single mode, Y junction",

author = "Kenta Miura and Yuki Machida and Masato Uehara and Hiromu Kiryu and Yusuke Ozawa and Tomoyuki Sasaki and Osamu Hanaizumi and Takahiro Satoh and Yasuyuki Ishii and Masashi Kohka and Katsuyoshi Takano and Takeru Ohkubo and Akiyoshi Yamazaki and Wataru Kada and Akihito Yokoyama and Tomihiro Kamiya and Hiroyuki Nishikawa",

note = "Copyright: Copyright 2020 Elsevier B.V., All rights reserved.; 6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, ISSS and AMDE 2010 ; Conference date: 09-12-2010 Through 10-12-2010",

year = "2012",

doi = "10.4028/www.scientific.net/KEM.497.147",

language = "English",

isbn = "9783037852859",

series = "Key Engineering Materials",

publisher = "Trans Tech Publications Ltd",

pages = "147--150",

booktitle = "Silicon Science and Advanced Micro-Device Engineering II",

}

TY - GEN

T1 - Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam

AU - Miura, Kenta

AU - Machida, Yuki

AU - Uehara, Masato

AU - Kiryu, Hiromu

AU - Ozawa, Yusuke

AU - Sasaki, Tomoyuki

AU - Hanaizumi, Osamu

AU - Satoh, Takahiro

AU - Ishii, Yasuyuki

AU - Kohka, Masashi

AU - Takano, Katsuyoshi

AU - Ohkubo, Takeru

AU - Yamazaki, Akiyoshi

AU - Kada, Wataru

AU - Yokoyama, Akihito

AU - Kamiya, Tomihiro

AU - Nishikawa, Hiroyuki

PY - 2012

Y1 - 2012

N2 - Proton beam writing (PBW) has attracted much attention recently as a next-generation micro-fabrication technology. It is a direct-drawing technique and does not need any masks to transfer micro-patterns to sample surfaces. In addition, the refractive index of a poly(methyl methacrylate) (PMMA) can be increased by proton-beam irradiation. In this study, we fabricated the first 1.5-μm-band single-mode, straight-line waveguides and Y-junction waveguides consisting of PMMA layers using the PBW technique.

AB - Proton beam writing (PBW) has attracted much attention recently as a next-generation micro-fabrication technology. It is a direct-drawing technique and does not need any masks to transfer micro-patterns to sample surfaces. In addition, the refractive index of a poly(methyl methacrylate) (PMMA) can be increased by proton-beam irradiation. In this study, we fabricated the first 1.5-μm-band single-mode, straight-line waveguides and Y-junction waveguides consisting of PMMA layers using the PBW technique.

KW - 1.5-μm band

KW - Optical waveguide

KW - PMMA

KW - Proton beam writing

KW - Single mode

KW - Y junction

UR - http://www.scopus.com/inward/record.url?scp=84855793863&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84855793863&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/KEM.497.147

DO - 10.4028/www.scientific.net/KEM.497.147

M3 - Conference contribution

AN - SCOPUS:84855793863

SN - 9783037852859

T3 - Key Engineering Materials

SP - 147

EP - 150

BT - Silicon Science and Advanced Micro-Device Engineering II

PB - Trans Tech Publications Ltd

T2 - 6th International Symposium on Silicon Science and 2nd International Conference on Advanced Micro-Device Engineering, ISSS and AMDE 2010

Y2 - 9 December 2010 through 10 December 2010

ER -

Fabrication of polymer optical waveguides for the 1.5-μm band using focused proton beam

Abstract

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Keywords

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