Far Infrared Study of Structural Distortion and Transformation of HfO2 by Introducing a Slight Amount Si

K. Tomida, K. Kita, K. Kyuno, A. Toriumi

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)790-791
JournalExtended Abstracts of 2004 International Conference on Solid State Devices and Materials (SSDM)
Publication statusPublished - 2004 Sept 1

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