Femtosecond laser-assisted etching of fluoride crystals

Shigeki Matsuo; Kodai Iwasa; Takuro Tomita; Shuichi Hashimoto; Tatsuya Okada

doi:10.2961/jlmn.2011.03.0014

Femtosecond laser-assisted etching of fluoride crystals

Shigeki Matsuo, Kodai Iwasa, Takuro Tomita, Shuichi Hashimoto, Tatsuya Okada

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF ₂ and MgF ₂. In the case of CaF ₂, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF ₂. Microchannels were fabricated in CaF ₂ substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.

Original language	English
Pages (from-to)	245-248
Number of pages	4
Journal	Journal of Laser Micro Nanoengineering
Volume	6
Issue number	3
DOIs	https://doi.org/10.2961/jlmn.2011.03.0014
Publication status	Published - 2011 Dec
Externally published	Yes

Keywords

CaF
Femtosecond laser-assisted etching
Fluoride
MgF
Micromachining

ASJC Scopus subject areas

Instrumentation
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

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10.2961/jlmn.2011.03.0014

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title = "Femtosecond laser-assisted etching of fluoride crystals",

abstract = "Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.",

keywords = "CaF, Femtosecond laser-assisted etching, Fluoride, MgF, Micromachining",

author = "Shigeki Matsuo and Kodai Iwasa and Takuro Tomita and Shuichi Hashimoto and Tatsuya Okada",

year = "2011",

month = dec,

doi = "10.2961/jlmn.2011.03.0014",

language = "English",

volume = "6",

pages = "245--248",

journal = "Journal of Laser Micro Nanoengineering",

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TY - JOUR

T1 - Femtosecond laser-assisted etching of fluoride crystals

AU - Matsuo, Shigeki

AU - Iwasa, Kodai

AU - Tomita, Takuro

AU - Hashimoto, Shuichi

AU - Okada, Tatsuya

PY - 2011/12

Y1 - 2011/12

N2 - Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.

AB - Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.

KW - CaF

KW - Femtosecond laser-assisted etching

KW - Fluoride

KW - MgF

KW - Micromachining

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DO - 10.2961/jlmn.2011.03.0014

M3 - Article

AN - SCOPUS:84861549312

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EP - 248

JO - Journal of Laser Micro Nanoengineering

JF - Journal of Laser Micro Nanoengineering

IS - 3

ER -

Femtosecond laser-assisted etching of fluoride crystals

Abstract

Keywords

ASJC Scopus subject areas

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