Fluorinated SiO₂ films for interlayer dielectrics in quarter-micron ULSI multilevel interconnections

Physics & Astronomy

• gases 11%
• glass 12%
• interlayers 100%
• liquid phases 18%
• permittivity 15%
• requirements 14%
• room temperature 24%
• temperature 6%
• vapor deposition 16%
• vapors 16%
• water 12%

Chemical Compounds

• Ambient Reaction Temperature 24%
• Chemical Vapour Deposition 19%
• Dielectric Constant 20%
• Dielectric Material 96%
• Gas 11%
• Liquid 11%
• Liquid Film 52%
• Purity 11%

Engineering & Materials Science

• Chemical vapor deposition 25%
• Gases 12%
• Glass 17%
• Liquids 14%
• Permittivity 22%
• Temperature 26%
• Vapors 19%
• Water 11%