Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings

Tomoji Ohishi; Kousei Ichikawa

doi:10.1016/j.matlet.2019.03.115

Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings

Tomoji Ohishi, Kousei Ichikawa

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150 °C to form a gas barrier film. This film primarily consisted of a thin layer of SiO ₂ , and had very high gas barrier properties, with a water vapor transmission rate of 0.02 g/m ² ·day or less (40 °C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices.

Original language	English
Pages (from-to)	143-146
Number of pages	4
Journal	Materials Letters
Volume	247
DOIs	https://doi.org/10.1016/j.matlet.2019.03.115
Publication status	Published - 2019 Jul 15

Keywords

Excimer light irradiation
Flexible electronics
Gas barrier characteristics
Heat-resistant PET film
Polysilazane

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings",

abstract = " A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150 °C to form a gas barrier film. This film primarily consisted of a thin layer of SiO 2 , and had very high gas barrier properties, with a water vapor transmission rate of 0.02 g/m 2 ·day or less (40 °C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices. ",

keywords = "Excimer light irradiation, Flexible electronics, Gas barrier characteristics, Heat-resistant PET film, Polysilazane",

author = "Tomoji Ohishi and Kousei Ichikawa",

note = "Funding Information: This research was partially supported by JSPS KAKENHI (JP 17K06821). Publisher Copyright: {\textcopyright} 2019",

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AU - Ohishi, Tomoji

AU - Ichikawa, Kousei

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Y1 - 2019/7/15

N2 - A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150 °C to form a gas barrier film. This film primarily consisted of a thin layer of SiO 2 , and had very high gas barrier properties, with a water vapor transmission rate of 0.02 g/m 2 ·day or less (40 °C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices.

AB - A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150 °C to form a gas barrier film. This film primarily consisted of a thin layer of SiO 2 , and had very high gas barrier properties, with a water vapor transmission rate of 0.02 g/m 2 ·day or less (40 °C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices.

KW - Excimer light irradiation

KW - Flexible electronics

KW - Gas barrier characteristics

KW - Heat-resistant PET film

KW - Polysilazane

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Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings

Abstract

Keywords

ASJC Scopus subject areas

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