Fully Planarized Multilevel Interconnection Using Selective SiO２ Deposition

T. Homma, T. Homma;T.Katoh;Y.Yamada;J.Shimizu;Y. Murao

Research output: Contribution to journal › Article › peer-review

Cite this

@article{7f40f5a57e36401495659c8b7d99b248,

title = "Fully Planarized Multilevel Interconnection Using Selective SiO２ Deposition",

author = "T. Homma and Murao, {T. Homma;T.Katoh;Y.Yamada;J.Shimizu;Y.}",

year = "1991",

month = jul,

day = "1",

language = "English",

volume = "32",

pages = "315--322",

journal = "NEC Research & Development",

}