Further EOT Scaling of Ge/HfO2 over Si/HfO2 MOS Systems

K. Kita, M. Sasagawa, K. Tomida, M. Toyama, K. Kyuno, A. Torium

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)
Original languageEnglish
JournalInternational Workshop on Gate Insulator (IWGI2003)
Publication statusPublished - 2003 Nov 1

Cite this