Abstract
Ion implantation causes the formation of nano-phases as well as radiation damage. “In-situ” observation in a TEM is a unique technique to clarify such phenomena. One example is Xe nanocrystals embedded in a metal matrix. HRTEM observations revealed the atomic structures and the motion of atoms in a Xe nanocrystal. Electron beam-induced deposition is another technique to fabricate nano-structures. Nanostructures having desired shape and size can be obtained. Metal atoms are deposited using focused electron beam irradiation under the presence of a small amount of precursor gas molecules on the substrate. The details of these ion and electron beam effects are reviewed.
Original language | English |
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Title of host publication | In-Situ Electron Microscopy at High Resolution |
Publisher | World Scientific Publishing Co. |
Pages | 229-258 |
Number of pages | 30 |
ISBN (Electronic) | 9789812797346 |
ISBN (Print) | 9812797335, 9789812797339 |
DOIs | |
Publication status | Published - 2008 Jan 1 |
Externally published | Yes |
ASJC Scopus subject areas
- Engineering(all)
- Materials Science(all)