Loss increase of (LuNdBi)3(FeAl)5O12 films caused by sputter etching

Hideki Yokoi; Tetsuya Mizumoto; Takehiro Ida; Kazuki Kozakai; Yoshiyuki Naito

Loss increase of (LuNdBi)₃(FeAl)₅O₁₂ films caused by sputter etching

Hideki Yokoi, Tetsuya Mizumoto, Takehiro Ida, Kazuki Kozakai, Yoshiyuki Naito

Research output: Contribution to journal › Article › peer-review

Abstract

Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)₃(FeAl)₅O₁₂ (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar⁺ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO₂ mask deposited onto LNB film instead of a Ti mask.

Original language	English
Pages (from-to)	6355-6359
Number of pages	5
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	33
Issue number	11
Publication status	Published - 1994 Nov
Externally published	Yes

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Cite this

@article{b18f8376145a46909e5e77dc65a49017,

title = "Loss increase of (LuNdBi)3(FeAl)5O12 films caused by sputter etching",

abstract = "Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.",

author = "Hideki Yokoi and Tetsuya Mizumoto and Takehiro Ida and Kazuki Kozakai and Yoshiyuki Naito",

year = "1994",

month = nov,

language = "English",

volume = "33",

pages = "6355--6359",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "11",

}

TY - JOUR

T1 - Loss increase of (LuNdBi)3(FeAl)5O12 films caused by sputter etching

AU - Yokoi, Hideki

AU - Mizumoto, Tetsuya

AU - Ida, Takehiro

AU - Kozakai, Kazuki

AU - Naito, Yoshiyuki

PY - 1994/11

Y1 - 1994/11

N2 - Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

AB - Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

UR - http://www.scopus.com/inward/record.url?scp=0028543290&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028543290&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0028543290

SN - 0021-4922

VL - 33

SP - 6355

EP - 6359

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 11

ER -

Loss increase of (LuNdBi)₃(FeAl)₅O₁₂ films caused by sputter etching

Abstract

ASJC Scopus subject areas

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