Fingerprint
Dive into the research topics of 'Low temperature plasmaless etching of silicon dioxide film using chlorine trifluoride gas with water vapor'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Low temperature plasmaless etching of silicon dioxide film using chlorine trifluoride gas with water vapor
Makoto Saito, Yoshinori Kataoka, Tetsuya Homma, Takao Nagatomo
Research output: Contribution to journal › Article › peer-review
10
Citations
(Scopus)