| Original language | English |
|---|---|
| Pages (from-to) | 64-65 |
| Journal | Proc. 2010 International Symposium on VLSI Technology, Systems and Applications |
| Publication status | Published - 2010 Apr 26 |
Material and Process Challenges for Interconnects in Nanoelectronics Era (Invited)
Research output: Contribution to journal › Article › peer-review