Micro-Nano Lithography by MeV Ion Beam Writing

Katsuyoshi Takano; Takahiro Satoh; Yasuyuki Ishii; Tomihiro Kamiya; Takeru Ohkubo; Masaki Sugimoto; Masashi Koka; Hiroyuki Nishikawa; Syu Seki

Micro-Nano Lithography by MeV Ion Beam Writing

Katsuyoshi Takano, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Takeru Ohkubo, Masaki Sugimoto, Masashi Koka, Hiroyuki Nishikawa, Syu Seki

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)
Publication status	Published - 2009 Sept 1

Cite this

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title = "Micro-Nano Lithography by MeV Ion Beam Writing",

author = "Katsuyoshi Takano and Takahiro Satoh and Yasuyuki Ishii and Tomihiro Kamiya and Takeru Ohkubo and Masaki Sugimoto and Masashi Koka and Hiroyuki Nishikawa and Syu Seki",

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language = "English",

journal = "Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)",

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TY - JOUR

T1 - Micro-Nano Lithography by MeV Ion Beam Writing

AU - Takano, Katsuyoshi

AU - Satoh, Takahiro

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

AU - Ohkubo, Takeru

AU - Sugimoto, Masaki

AU - Koka, Masashi

AU - Nishikawa, Hiroyuki

AU - Seki, Syu

PY - 2009/9/1

Y1 - 2009/9/1

M3 - Article

JO - Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)

JF - Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)

ER -