Micro-patterning of Siloxane Films by Proton Beam Writing

Hiroyuki Nishikawa, Ryutaro Tsuchiya, Tetsuro Yasukawa, Tomoki Kaneko, Yusuke Furuta, Tomoji Ohishi

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	239-243
Journal	Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)
Volume	22
Publication status	Published - 2009 Jun 1

Cite this

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title = "Micro-patterning of Siloxane Films by Proton Beam Writing",

author = "Hiroyuki Nishikawa and Ryutaro Tsuchiya and Tetsuro Yasukawa and Tomoki Kaneko and Yusuke Furuta and Tomoji Ohishi",

year = "2009",

month = jun,

day = "1",

language = "English",

volume = "22",

pages = "239--243",

journal = "Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)",

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TY - JOUR

T1 - Micro-patterning of Siloxane Films by Proton Beam Writing

AU - Nishikawa, Hiroyuki

AU - Tsuchiya, Ryutaro

AU - Yasukawa, Tetsuro

AU - Kaneko, Tomoki

AU - Furuta, Yusuke

AU - Ohishi, Tomoji

PY - 2009/6/1

Y1 - 2009/6/1

M3 - Article

VL - 22

SP - 239

EP - 243

JO - Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)

JF - Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)

ER -