TY - JOUR
T1 - Micropatterning of polydiacetylene nanoparticle monolayer based on ultraviolet or electron beam polymerization
AU - Tanaka, Daisuke
AU - Karube, Hisashi
AU - Shimojo, Masayuki
AU - Kajikawa, Kotaro
PY - 2011/12
Y1 - 2011/12
N2 - A simple fabrication method is reported to obtain patterned polydiacetylene (PDA) nanoparticle (NP) monolayers, on the basis of polymerization of diacetylene NPs by UV light or electron beam (EB) irradiation. The UV patterning can be made within a resolution of 1.1 μm, using a mesh copper grid as a mask. The EB irradiation also brings about the polymerization, and patterned PDA NP monolayers were formed; however, the resolution of the patterning was lower than expected (∼2.5 μm), even using a narrow EB. Electron scattering, heating or defocusing will be the cause of the lower resolution.
AB - A simple fabrication method is reported to obtain patterned polydiacetylene (PDA) nanoparticle (NP) monolayers, on the basis of polymerization of diacetylene NPs by UV light or electron beam (EB) irradiation. The UV patterning can be made within a resolution of 1.1 μm, using a mesh copper grid as a mask. The EB irradiation also brings about the polymerization, and patterned PDA NP monolayers were formed; however, the resolution of the patterning was lower than expected (∼2.5 μm), even using a narrow EB. Electron scattering, heating or defocusing will be the cause of the lower resolution.
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U2 - 10.1143/APEX.4.121604
DO - 10.1143/APEX.4.121604
M3 - Article
AN - SCOPUS:83455200112
SN - 1882-0778
VL - 4
JO - Applied Physics Express
JF - Applied Physics Express
IS - 12
M1 - 121604
ER -