Abstract
We have developed a new technique for monitoring the concentration of reaction products during puddle development in ultralarge-scale integration (ULSI) lithography. Optical measurement has been employed for monitoring the concentration of reaction products by detecting reflected light from a wafer surface, and compared with the sampling method (UV-visible spectroscopy) for reaction products from a developer solution. A correlation coefficient of 0.89 was obtained, indicating a good correlation between this optical method and sampling method. We concluded that the newly developed optical monitoring technique is useful for measuring the concentration of reaction products.
| Original language | English |
|---|---|
| Pages (from-to) | 128-130 |
| Number of pages | 3 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 46 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2007 Jan 10 |
Keywords
- Developer solution
- Lambert-Beer's law
- Optical monitoring technique
- Puddle development
- Reaction product
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)