Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

K. Mitsuishi; M. Shimojo; M. Tanaka; K. Furuya

doi:10.1016/j.nimb.2005.08.022

Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

K. Mitsuishi, M. Shimojo, M. Tanaka, K. Furuya

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

Original language	English
Pages (from-to)	244-246
Number of pages	3
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	242
Issue number	1-2
DOIs	https://doi.org/10.1016/j.nimb.2005.08.022
Publication status	Published - 2006 Jan 1
Externally published	Yes

Keywords

Electron-beam-induced deposition
Ion-beam milling
Nano-fabrication

ASJC Scopus subject areas

Nuclear and High Energy Physics
Instrumentation

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10.1016/j.nimb.2005.08.022

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title = "Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling",

abstract = "A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.",

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author = "K. Mitsuishi and M. Shimojo and M. Tanaka and K. Furuya",

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T1 - Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

AU - Mitsuishi, K.

AU - Shimojo, M.

AU - Tanaka, M.

AU - Furuya, K.

PY - 2006/1/1

Y1 - 2006/1/1

N2 - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

AB - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

KW - Electron-beam-induced deposition

KW - Ion-beam milling

KW - Nano-fabrication

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SN - 0168-583X

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EP - 246

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 1-2

ER -

Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

Abstract

Keywords

ASJC Scopus subject areas

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