Abstract
Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.
Original language | English |
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Article number | 01006 |
Journal | MATEC Web of Conferences |
Volume | 8 |
DOIs | |
Publication status | Published - 2013 |
Externally published | Yes |
Event | Workshop on Progress in Ultrafast Laser Modifications of Materials, 2013 - Cargese, France Duration: 2013 Apr 14 → 2013 Apr 19 |
ASJC Scopus subject areas
- Chemistry(all)
- Materials Science(all)
- Engineering(all)