Optical isolator using a nonreciprocal phase shift with a semiconductor guiding layer

Tetsuya Mizumoto; Hideki Yokoi; Nobuhiro Shinjo; Naoki Futakuchi; Yoshiaki Nakano

Optical isolator using a nonreciprocal phase shift with a semiconductor guiding layer

Tetsuya Mizumoto, Hideki Yokoi, Nobuhiro Shinjo, Naoki Futakuchi, Yoshiaki Nakano

Research output: Contribution to journal › Conference article › peer-review

Abstract

An optical isolator composed of a semiconductor guiding layer is studied. The isolator employing a nonreciprocal phase shift was fabricated by using wafer bonding technique. The nonreciprocal phase shift was measured in the fabricated device.

Original language	English
Pages (from-to)	700-701
Number of pages	2
Journal	Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume	2
Publication status	Published - 2000 Dec 1
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

Cite this

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title = "Optical isolator using a nonreciprocal phase shift with a semiconductor guiding layer",

abstract = "An optical isolator composed of a semiconductor guiding layer is studied. The isolator employing a nonreciprocal phase shift was fabricated by using wafer bonding technique. The nonreciprocal phase shift was measured in the fabricated device.",

author = "Tetsuya Mizumoto and Hideki Yokoi and Nobuhiro Shinjo and Naoki Futakuchi and Yoshiaki Nakano",

year = "2000",

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language = "English",

volume = "2",

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journal = "Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS",

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publisher = "Institute of Electrical and Electronics Engineers Inc.",

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T1 - Optical isolator using a nonreciprocal phase shift with a semiconductor guiding layer

AU - Mizumoto, Tetsuya

AU - Yokoi, Hideki

AU - Shinjo, Nobuhiro

AU - Futakuchi, Naoki

AU - Nakano, Yoshiaki

PY - 2000/12/1

Y1 - 2000/12/1

N2 - An optical isolator composed of a semiconductor guiding layer is studied. The isolator employing a nonreciprocal phase shift was fabricated by using wafer bonding technique. The nonreciprocal phase shift was measured in the fabricated device.

AB - An optical isolator composed of a semiconductor guiding layer is studied. The isolator employing a nonreciprocal phase shift was fabricated by using wafer bonding technique. The nonreciprocal phase shift was measured in the fabricated device.

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M3 - Conference article

AN - SCOPUS:0034475381

SN - 1092-8081

VL - 2

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EP - 701

JO - Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

JF - Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

ER -

Optical isolator using a nonreciprocal phase shift with a semiconductor guiding layer

Abstract

ASJC Scopus subject areas

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