Optical isolator with amorphous silicon waveguide core on magneto-optical garnet

K. Miura; T. Hirasawa; J. Kang; Y. Shoji; Y. Okada; H. Yokoi; N. Nishiyama; S. Arai; T. Mizumoto

doi:10.1109/Group4.2014.6961954

Optical isolator with amorphous silicon waveguide core on magneto-optical garnet

K. Miura, T. Hirasawa, J. Kang, Y. Shoji, Y. Okada, H. Yokoi, N. Nishiyama, S. Arai, T. Mizumoto

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

An optical isolator is fabricated with an amorphous silicon waveguide core deposited using a plasma-enhanced chemical-vapor-deposition technique on a magneto-optical garnet Ce:YIG. An isolation ratio of 17 dB is demonstrated.

Original language	English
Title of host publication	IEEE International Conference on Group IV Photonics GFP
Publisher	IEEE Computer Society
Pages	116-117
Number of pages	2
ISBN (Electronic)	9781479922833
DOIs	https://doi.org/10.1109/Group4.2014.6961954
Publication status	Published - 2014 Nov 18
Event	11th International Conference on Group IV Photonics, GFP 2014 - Paris, France Duration: 2014 Aug 27 → 2014 Aug 29

Publication series

Name	IEEE International Conference on Group IV Photonics GFP
ISSN (Print)	1949-2081

Conference

Conference	11th International Conference on Group IV Photonics, GFP 2014
Country/Territory	France
City	Paris
Period	14/8/27 → 14/8/29

ASJC Scopus subject areas

Electrical and Electronic Engineering
Ceramics and Composites
Electronic, Optical and Magnetic Materials

Access to Document

10.1109/Group4.2014.6961954

Cite this

Miura, K., Hirasawa, T., Kang, J., Shoji, Y., Okada, Y., Yokoi, H., Nishiyama, N., Arai, S., & Mizumoto, T. (2014). Optical isolator with amorphous silicon waveguide core on magneto-optical garnet. In IEEE International Conference on Group IV Photonics GFP (pp. 116-117). Article 6961954 (IEEE International Conference on Group IV Photonics GFP). IEEE Computer Society. https://doi.org/10.1109/Group4.2014.6961954

Optical isolator with amorphous silicon waveguide core on magneto-optical garnet. / Miura, K.; Hirasawa, T.; Kang, J. et al.
IEEE International Conference on Group IV Photonics GFP. IEEE Computer Society, 2014. p. 116-117 6961954 (IEEE International Conference on Group IV Photonics GFP).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Miura, K, Hirasawa, T, Kang, J, Shoji, Y, Okada, Y, Yokoi, H, Nishiyama, N, Arai, S & Mizumoto, T 2014, Optical isolator with amorphous silicon waveguide core on magneto-optical garnet. in IEEE International Conference on Group IV Photonics GFP., 6961954, IEEE International Conference on Group IV Photonics GFP, IEEE Computer Society, pp. 116-117, 11th International Conference on Group IV Photonics, GFP 2014, Paris, France, 14/8/27. https://doi.org/10.1109/Group4.2014.6961954

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abstract = "An optical isolator is fabricated with an amorphous silicon waveguide core deposited using a plasma-enhanced chemical-vapor-deposition technique on a magneto-optical garnet Ce:YIG. An isolation ratio of 17 dB is demonstrated.",

author = "K. Miura and T. Hirasawa and J. Kang and Y. Shoji and Y. Okada and H. Yokoi and N. Nishiyama and S. Arai and T. Mizumoto",

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AU - Okada, Y.

AU - Yokoi, H.

AU - Nishiyama, N.

AU - Arai, S.

AU - Mizumoto, T.

PY - 2014/11/18

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Optical isolator with amorphous silicon waveguide core on magneto-optical garnet

Abstract

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Access to Document

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