Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation

T. Ohishi; S. Maekawa; T. Ishikawa; D. Kamoto

doi:10.1007/BF02436891

Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation

T. Ohishi, S. Maekawa, T. Ishikawa, D. Kamoto

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO₂/SnO₂ were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.

Original language	English
Pages (from-to)	511-515
Number of pages	5
Journal	Journal of Sol-Gel Science and Technology
Volume	8
Issue number	1-3
DOIs	https://doi.org/10.1007/BF02436891
Publication status	Published - 1997 Jan 1
Externally published	Yes

Keywords

Anti-reflection/anti-static film
Photoirradiation
Sol-gel method

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Biomaterials
Condensed Matter Physics
Materials Chemistry

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10.1007/BF02436891

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abstract = "A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.",

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AU - Maekawa, S.

AU - Ishikawa, T.

AU - Kamoto, D.

PY - 1997/1/1

Y1 - 1997/1/1

N2 - A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.

AB - A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.

KW - Anti-reflection/anti-static film

KW - Photoirradiation

KW - Sol-gel method

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JF - Journal of Sol-Gel Science and Technology

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Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation

Abstract

Keywords

ASJC Scopus subject areas

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