Preparation and properties of SiO2 thin films by the sol-gel method using photoirradiation and its application to surface coating for display

Tomoji Ohishi

Preparation and properties of SiO₂ thin films by the sol-gel method using photoirradiation and its application to surface coating for display

Tomoji Ohishi

Research output: Chapter in Book/Report/Conference proceeding › Chapter

Original language	English
Title of host publication	Chemical Processing of Ceramics, Second Edition
Publisher	CRC Press
Pages	421-436
Number of pages	16
ISBN (Electronic)	9781420027334
ISBN (Print)	9781574446487
Publication status	Published - 2005 Jan 1

ASJC Scopus subject areas

Engineering(all)
Materials Science(all)
Chemistry(all)
Chemical Engineering(all)

Cite this

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Preparation and properties of SiO2 thin films by the sol-gel method using photoirradiation and its application to surface coating for display

ASJC Scopus subject areas

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Cite this

Preparation and properties of SiO₂ thin films by the sol-gel method using photoirradiation and its application to surface coating for display