Properties of electrodeposited germanium thin films

Yasutaka Uchida, Tomoko Funayama, Yoshiaki Kogure, Kazuyoshi Ueno

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


In this paper, the results of Ge film deposited by electroplating method was studied and showed the possibility of making a NIRS sensor by the Ge film. Cu/Ti double layer structure could use the cathode electrode on the glass substrate during the GeCl4 electroplating. The deposition rate of electroplating Ge film was 100 nm/h, however, that rate was improved to 570 nm/h by introducing a spacer between Cu thin film and extraction electrode and Ar gas bubbling. The oxygen content of as-deposited film was about 10%, however, this value reduced to lower than 1% by using the Ar bubbling. The deposited film was amorphous and its optical band gap was 0.73 eV. 200 nm-thick Ge film was formed on flexible substrate by electroplating method.

Original languageEnglish
Pages (from-to)1661-1664
Number of pages4
JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
Issue number11-12
Publication statusPublished - 2014 Nov 1


  • Electroplate
  • Flexible substrate
  • Germanium
  • NIRS sensor
  • Thin film

ASJC Scopus subject areas

  • Condensed Matter Physics


Dive into the research topics of 'Properties of electrodeposited germanium thin films'. Together they form a unique fingerprint.

Cite this