Quarter-micron Cu metallization using ultra-thin TiN barrier layers

K.Ueno K.Ueno, K.Ohta K.Ohta, K.Tsunenari K.Tsunenari, Kazuyoshi Ueno

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	95-101
Journal	Advanced Metallization for ULSI Applications in 1994
Publication status	Published - 1994 Oct 1

Cite this

@article{6edd53b14dfc40e7b2c9ae52b0c87f2d,

title = "Quarter-micron Cu metallization using ultra-thin TiN barrier layers",

author = "K.Ueno K.Ueno and K.Ohta K.Ohta and K.Tsunenari K.Tsunenari and Kazuyoshi Ueno",

year = "1994",

month = oct,

day = "1",

language = "English",

pages = "95--101",

journal = "Advanced Metallization for ULSI Applications in 1994",

}