Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

F. Tochikubo, T. Watanabe, H. Nishikawa, E. Watanabe, D. Ito, T. Okumura, H. Kaibe

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	21-30
Journal	Memoirs of Faculty of Engineering
Publication status	Published - 1997 Jan 1

Cite this

@article{46525ca1e9b7400e8dad6e9c188da956,

title = "Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing",

author = "F. Tochikubo and T. Watanabe and H. Nishikawa and E. Watanabe and D. Ito and T. Okumura and H. Kaibe",

year = "1997",

month = jan,

day = "1",

language = "English",

pages = "21--30",

journal = "Memoirs of Faculty of Engineering",

}

TY - JOUR

T1 - Relation between plasma-induced damage to SiO2 film and high energy particles in plasma processing

AU - Tochikubo, F.

AU - Watanabe, T.

AU - Nishikawa, H.

AU - Watanabe, E.

AU - Ito, D.

AU - Okumura, T.

AU - Kaibe, H.

PY - 1997/1/1

Y1 - 1997/1/1

M3 - Article

SP - 21

EP - 30

JO - Memoirs of Faculty of Engineering

JF - Memoirs of Faculty of Engineering

ER -