Reversible creation and annihilation of a local leakage path in HfO 2/GeOx stacked gate dielectrics: A direct observation by ultrahigh vacuum conducting atomic force microscopy

K. Yamamura, K. Kita, A. Toriumi, K. Kyuno

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

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Physics & Astronomy