Stable silica membranes prepared by using a counter diffusion chemical vapor deposition for high temperature hydrogen separation

Mikihiro Nomura, Surag Gopalakrishnan, Hitoshi Aida, Takashi Sugawara, Shin-ichi Nakao

Research output: Contribution to journal › Article › peer-review

Cite this

@article{aa2babcdc6314563af5f0265aef9f606,

title = "Stable silica membranes prepared by using a counter diffusion chemical vapor deposition for high temperature hydrogen separation",

author = "Mikihiro Nomura and Surag Gopalakrishnan and Hitoshi Aida and Takashi Sugawara and Shin-ichi Nakao",

year = "2005",

month = oct,

day = "10",

language = "English",

pages = "101--104",

journal = "Default journal",

}