Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator

Y.Yamamoto Y.Yamamoto, K.Kita K.Kita, K.Kyuno K.Kyuno, A.Toriumi A.Toriumi, Kentaro Kyuno

Research output: Contribution to journal › Article › peer-review

Cite this

@article{da38f899b0384871a10bfe86ab336ba4,

title = "Structure and electrical properties of HfLaOx films for an amorphous high-k gate insulator",

author = "Y.Yamamoto Y.Yamamoto and K.Kita K.Kita and K.Kyuno K.Kyuno and A.Toriumi A.Toriumi and Kentaro Kyuno",

year = "2006",

month = apr,

day = "1",

language = "English",

volume = "89",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

}