Surface amorphization in Zr alloy films via Ni implantation

Shinji Muraishi, Hirono Naito, Tatuhiko Aizawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)


Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.

Original languageEnglish
Title of host publicationSurfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine
Number of pages5
Publication statusPublished - 2006 Dec 1
Event135th TMS Annual Meeting, 2006 - San Antonio, TX, United States
Duration: 2006 Mar 122006 Mar 16

Publication series

NameTMS Annual Meeting


Conference135th TMS Annual Meeting, 2006
Country/TerritoryUnited States
CitySan Antonio, TX


  • Ion implantation
  • Metallic glass
  • Solid-state amorphization
  • Zr-Cu film

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys


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